@patent {337131,
	title = {Patterning Structures Using Deformable Substrates},
	volume = {US8557341 B2},
	number = {U.S. Patent and Trademark Office},
	year = {2013},
	edition = {United States of America},
	chapter = {US},
	abstract = {Aspects of the present invention describe soft imprint lithography methods capable of preparing structural features on surfaces. Disclosed methods include surmounting a deformable substrate, having an original form, with a composition, wherein the deformable substrate is capable of achieving at least one predetermined deformed state; predictably deforming said deformable substrate from its original form to the at least one predetermined deformed state; and transferring at least a portion of the composition surmounting the deformed substrate to a receiving substrate.},
	url = {http://patft.uspto.gov/netacgi/nph-Parser?Sect2=PTO1\&Sect2=HITOFF\&p=1\&u=/netahtml/PTO/search-bool.html\&r=1\&f=G\&l=50\&d=PALL\&RefSrch=yes\&Query=PN/8557341},
	author = {Shu Yang and Zhang, Ying and Randall D. Kamien and James Makoto Kikkawa and Elisabetta A. Matsumoto and Dinesh Chandra}
}
