CNS Tools and Technologies

  • Nanowire Transistor


  • Q-dot Devices

  • MEMS Systems

  • Linear and NonLinear Confocal Microscopies

  • Advanced SEM and TEM Imaging

  • Nanodisk Photonics

  • Diamond Photonics

  • Injectable Self-assembling Inorganic Scaffold


The Center for Nanoscale Systems (CNS) was created with a very clear visionTo provide a collaborative multi-disciplinary research environment to support of the creation and evolution of world-class shared facilities and technical expertise, for the Harvard research community as well as the larger community of external researchers from academia and industry. 

Our Core Values:

  • Facilitating leading-edge, multi-disciplinary, research and education in the areas of fabrication, imaging, and characterization of nanoscale structures, across the disciplines of applied physics, biology, chemistry, electrical engineering, geology, materials science, medicine and physics.

  • Creating a “world-class” collaborative nanotechnology research community by providing shared instrumentation facilities and infrastructure, expert staff, synergistic meeting places, and educational opportunities conducive to productive scientific engagement.

CNS strives to provide world-class tools for world-class research, fostering a strong competitive edge for our nation’s investigators.  We serve a broad, diverse, national set of users who are preparing the nation to meet the needs of next generation technologies.

Latest News

Nanoscribe 3D Printing System: Up and Running

May 18, 2015
Nanoscribe 3D Printing System: Up and Running

A New 3D Laser Lithography capability at CNS: The Nanoscribe Photonic Professional GT

The new generation of Nanoscribe´s 3D laser lithography systems, Photonic Professional GT, provide a fast and powerful platform for 3D micro- and nanofabrication demands.  Almost and arbitrarily defined complex polymer structures can be fabricated with feature sizes in the sub-micrometer range achieved by means of two-photon polymerization.  A tremendous speed-up of the writing process is driven by an embedded ultra-high precision galvo technology, which laterally deflects the laser focus position by use of a galvanic mirror system. Thus, the fabrication of large area 3D micro- and nanostructures is now feasible in shortest time. In addition to rapid x-y-beam-scanning, a piezoelectric scanning stage provides ultra-precise x-y-z-movements of the substrate relative to the laser focus position - a proven feature retained from the Photonic Professional basic unit. Speed, precision and extraordinary resolution prove these 3D printers to serve as disruptive enablers for novel applications. The table-top laser lithography systems are fully automated. An intuitive, userfriendly software as integral part of an innovative workflow eases demanding tasks and secures their successful completion. Structures can either be designed in 3D printer compatible CAD software programs or directly implemented in Nanoscribe´s GWL scripting language. The software package features a fast interactive 3D preview of the printing output.

 Key Attributes

  • Highest resolution commercially available 3D printer
  • Fast and accurate by galvo and piezo technology
  • Easy fabrication of 3D micro- and nanostructures
  • Two-photon polymerization of various UV-curable photoresists
  • Writing area up to the centimeter range
  • User-friendly software package
  • Easy CAD import via DXF, STL file format